为采用微合金化策略,在银（Ag）膜中掺杂钽（Ta）并对其反射光谱、晶体结构和表面形貌进行表征。结果表明,在合适的Ta掺杂浓度下,AgTa薄膜经600 ℃真空退火后,红外反射率可达95%以上,且保持优异的微结构稳定性。
Abstract
Conventional infrared reflective layers often struggle with thermal instability at high temperatures or insufficient infrared reflectivity, limiting their practical applications. In this study, we employed a microalloying approach to enhance film performance by incorporating tantalum （Ta） into silver （Ag） films via magnetron sputtering. The reflective spectra, crystal structure, and surface morphology of the films were systematically analyzed. The results indicate that Ta doping effectively inhibites the preferred growth of the Ag（111） crystal plane. Furthermore, high-vacuum thermal stability tests at 600 ℃ confirm that the AgTa infrared reflective coatings retain excellent optical and structural stability, even under elevated temperatures.
关键词
微合金化 /
银 /
热稳定性 /
选择性吸收涂层 /
红外反射层 /
反射率 /
磁控溅射
Key words
microalloying /
Ag /
thermal stability /
IR reflective layer /
reflectance /
magnetron sputtering
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基金
国家重点研发计划（2021YFB3700604）; 浙江省自然科学基金重点项目（LZ25E010001）
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