RESEARCH ON nc-Si:H/nc-SiOx:H STACKED THIN FILMS AS SILICON HETEROJUNCTION SOLAR CELL WINDOW LAYER

Yang Yuhao; Liu Wenzhu; Zhang Liping; Meng Fanying; Gao Yanfeng; Liu Zhengxin

doi:10.19912/j.0254-0096.tynxb.2021-1600

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Acta Energiae Solaris Sinica ›› 2023, Vol. 44 ›› Issue (8) : 203-207. DOI: 10.19912/j.0254-0096.tynxb.2021-1600

RESEARCH ON nc-Si:H/nc-SiO_x:H STACKED THIN FILMS AS SILICON HETEROJUNCTION SOLAR CELL WINDOW LAYER

Yang Yuhao^1,2, Liu Wenzhu², Zhang Liping², Meng Fanying², Gao Yanfeng¹, Liu Zhengxin²

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Abstract

In this work, the highly conductive, highly transparent phosphorus-doped hydrogenated nanocrystalline silicon oxide （nc-SiO_x:H） film is prepared, which is successfully applied as the window layer of silicon heterojunction （SHJ） cells to replace the traditional hydrogenated amorphous silicon （a-Si:H） film. Compared with the cell with a-Si:H thin film as the window layer, the short-circuit current density can be increased by 0.5 mA/cm² to 38.5 mA/cm², the fill factor is 82.7%, and the efficiency is 23.5%. In addition, the intrinsic amorphous silicon layer was surface treated before nc-SiO_x:H film deposition. The deposition of 1 nm nanocrystalline silicon seed layer can improve the crystallinity of nc-SiO_x:H film and reduce the content of amorphous phase in the film. Compared with the fill factor of the cell with nc-SiO_x:H film, the fill factor of the cell with nc-Si:H/ nc-SiO_x:H stacked thin films is increased to 83.4%, and the efficiency increased by 0.3% to 23.8%.

Key words

nanocrystalline materials / solar cells / film growth / silicon heterojunction solar cells / hydrogenated nanocrystalline silicon oxide （nc-SiO_x:H） / interface treatment

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Yang Yuhao, Liu Wenzhu, Zhang Liping, Meng Fanying, Gao Yanfeng, Liu Zhengxin. RESEARCH ON nc-Si:H/nc-SiO_x:H STACKED THIN FILMS AS SILICON HETEROJUNCTION SOLAR CELL WINDOW LAYER[J]. Acta Energiae Solaris Sinica. 2023, 44(8): 203-207 https://doi.org/10.19912/j.0254-0096.tynxb.2021-1600

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